Journal metric profile

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING

Clarivate Journal Citation Reports (JCR)-based Journal Impact Factor, five-year Impact Factor, quartile, category rank, publisher, identifiers and citation profile for the 2025 metric year.

JCR-based Impact Factor 2.300 2025 metric year
5-Year Impact Factor 2.900 Longer citation window
JCR Quartile Q3 Subject-category quartile
JCR Category Rank 197/366 Recorded category rank

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING JCR impact factor overview

Automatically generated from the journal record shown on this page.

Page reviewed August 6, 2026

Clarivate JCR impact factor overview

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING is listed in this directory with bibliometric information for 2025. It is published by IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC. The database records a Journal Impact Factor of 2.300, presented as a Clarivate Journal Citation Reports (JCR)-based metric. Its listed JCR Impact Factor quartile is Q3.

Ranking and quartile

The recorded JCR Impact Factor category rank is 197 out of 366 journals in its listed category. A Q3 designation describes the journal’s position within its subject category; it should not be used as a direct measure of the quality of an individual article.

Citation profile

The record contains 2,629 total citations, 72 total articles, 72 citable items. The five-year Impact Factor is 2.900, which is 0.600 points above the listed standard Journal Impact Factor. These values use different citation windows and should be interpreted together rather than as a direct trend. The Journal Impact Factor without journal self-citations is recorded as 2.100. The Journal Citation Indicator is listed as 0.470.

Citation half-life

The cited half-life is recorded as 7.2 years, describing the median age of articles cited in the reporting year. The citing half-life is 7.4 years, reflecting the median age of references used by the journal’s articles.

Journal identifiers and verification

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING is identified in this record by print ISSN 0894-6507 and electronic ISSN 1558-2345. Use the ISSN when checking library catalogues, publisher records, indexing databases, or the official Clarivate Journal Citation Reports entry.

Complete journal information

All values below come directly from the database record.

Journal nameIEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING
Abbreviated journalIEEE T SEMICONDUCT M
PublisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Metric year2025
Overall rank7,030
ISSN0894-6507
eISSN1558-2345
Total cites2,629
Total articles72
Citable items72
Cited half-life7.2 years
Citing half-life7.4 years
JCR-based Journal Impact Factor2.300
5-Year Impact Factor2.900
Impact Factor without journal self-cites2.100
Journal Citation Indicator0.470
JCR Impact Factor quartileQ3
JCR category rank197/366
Database record updated

Frequently asked questions

What is the 2025 JCR-based Journal Impact Factor of IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING?

The Journal Impact Factor recorded in this directory as a Clarivate Journal Citation Reports (JCR)-based value for IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING is 2.300 for the 2025 metric year.

What quartile is IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING?

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING is listed in quartile Q3. Quartiles describe a journal’s position within a subject category and should be interpreted within that field.

Who publishes IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING?

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING is listed as being published by IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC.

Can a JCR Journal Impact Factor be used to judge an individual article?

No. The Journal Impact Factor is a journal-level citation measure reported in Clarivate Journal Citation Reports. It does not measure the quality, reliability or influence of every individual article published by that journal.

Additional records from the same publisher or with a similar listed JCR Impact Factor.